Abstract
The integration of graphene into existing state-of-the-art semiconductor manufacturing is a topic of worldwide interest. With its unprecedented electrical, thermal and mechanical properties, graphene is ideally suited for back-end of line (BEOL) technology to boost the performance of on-chip copper (Cu) interconnects. However, the lack of BEOL compatible methods has stymied the true evaluation of Cu/graphene hybrid (Cu-G) technology. The objectives of this thesis proposal are to demonstrate BEOL-compatible graphene growth techniques, and explore various avenues for practical integration of graphene in order to achieve better electrical, thermal and reliability metrics than traditional interconnect technology.
Degree Type
Dissertation
Degree Name
Doctor of Philosophy (PhD)
Department
Electrical and Computer Engineering
Date of Award
January 2016
Recommended Citation
Mehta, Ruchit, "TOWARDS INTEGRATION OF GRAPHENE IN ADVANCED CMOS INTERCONNECT TECHNOLOGY" (2016). Open Access Dissertations. 1392.
https://docs.lib.purdue.edu/open_access_dissertations/1392
First Advisor
Zhihong Chen
Committee Member 1
David B Janes
Committee Member 2
Amy M Marconnet
Committee Member 3
Xiulin Ruan