Abstract
Laser shock imprinting (LSI) is proposed and developed as a novel ultrafast room-temperature top-down technique for fabricating and tuning of plasmonic nanostructures, and processing of one-dimensional semiconductor nanowires and two-dimensional crystals. The technique utilizes a shock pressure generated by laser ablation of sacrificial materials. Compared with conventional technologies, LSI features ambient condition, good scalability, low cost and high efficiency.
Degree Type
Dissertation
Degree Name
Doctor of Philosophy (PhD)
Department
Industrial Engineering
Date of Award
January 2016
Recommended Citation
Hu, Yaowu, "LASER SHOCK IMPRINTING OF METALLIC NANOSTRUCTURES AND SHOCK PROCESSING OF LOW-DIMENSIONAL MATERIALS" (2016). Open Access Dissertations. 1215.
https://docs.lib.purdue.edu/open_access_dissertations/1215
First Advisor
Gary J. Cheng
Committee Member 1
Gary J. Cheng
Committee Member 2
Peide Ye
Committee Member 3
Joseph Irudayaraj
Committee Member 4
Ramses V Martinez
Committee Member 5
Yi Xuan