Date of Award
January 2014
Degree Type
Dissertation
Degree Name
Doctor of Philosophy (PhD)
Department
Chemical Engineering
First Advisor
Fabio Ribeiro
Committee Member 1
Michael Harris
Committee Member 2
Nicholas Delgass
Committee Member 3
Dmitry Zemlyanov
Abstract
Recently, atomic layer deposition (ALD) has been employed as a promising technique for the growth of solid thin films with high conformality on complex geometries such as heterogeneous catalysts and microelectronic devices. In this work, surface sensitive characterization techniques have been employed to investigate initial precursor-substrate reactions and ALD surface chemistry.
Recommended Citation
Gharachorlou, Amir, "SURFACE SCIENCE APPROACH TO ATOMIC LAYER DEPOSITION CHEMISTRY" (2014). Open Access Dissertations. 1077.
https://docs.lib.purdue.edu/open_access_dissertations/1077
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