A Physical Model for Non-ohmic Shunt Conduction and Metastability in Amorphous Silicon p-i-n Solar Cells
Abstract
We present a physical model of non-ohmic shunt current in a-Si:H p-i-n solar cells, and validate it with detailed measurements. This model is based on space-charge-limited (SCL) transport through localized p-i-p shunt paths, which can arise from contact metal incorporation in a-Si:H layer. This model explains both the electrical characteristics and the metastable switching behavior of the shunts within an integrated framework. We first verify the SCL model using simulations and statistically robust measurements, and then use this picture to analyze our systematic observations of non-volatile switching in these shunts. Our work not only resolves broad experimental observations on shunt behavior, but also suggests possible techniques for alleviating shunt induced performance and reliability issues.
Keywords
Thin film solar cells, shunt, metastable switching, variability, reliability, voltage stress
DOI
10.1109/PVSC.2011.6186664
Citation
37th IEEE Photovoltaic Specialists Conference, 2011
Date of this Version
2011
Recommended Citation
Dongaonkar, Sourabh; Y, Karthik; Mahapatra, Souvik; and Alam, Muhammad A., "A Physical Model for Non-ohmic Shunt Conduction and Metastability in Amorphous Silicon p-i-n Solar Cells" (2011). Birck and NCN Publications. Paper 761.
http://dx.doi.org/10.1109/PVSC.2011.6186664