Parallel optical nanolithography using nanoscale bowtie aperture array

Author

• Sreemanth MV Uppuluri, Purdue University - Main CampusFollow
• Edward C. Kinzel, Purdue University - Main CampusFollow
• Yan Li, Purdue University - Main Campus
• Xianfan Xu, Birck Nanotechnology Center, School of Materials Engineering, Purdue UniversityFollow

Abstract

We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated.

Comments

Sreemanth M.V. Uppuluri, Edward C. Kinzel, Yan Li, and Xianfan Xu. Parallel optical nanolithography using nanoscale bowtie aperture array. Optics Express Vol. 18, Issue 7, pp. 7369-7375 (2010) https://doi.org/10.1364/OE.18.007369

Keywords

PLANAR NANO-APERTURES; NEAR-FIELD; DATA-STORAGE; TRANSMISSION; LITHOGRAPHY; METALS

DOI

10.1364/OE.18.007369

Citation

Sreemanth M.V. Uppuluri, Edward C. Kinzel, Yan Li, and Xianfan Xu. Parallel optical nanolithography using nanoscale bowtie aperture array. Optics Express Vol. 18, Issue 7, pp. 7369-7375 (2010) https://doi.org/10.1364/OE.18.007369

Date of this Version

3-2010

Recommended Citation

Uppuluri, Sreemanth MV; Kinzel, Edward C.; Li, Yan; and Xu, Xianfan, "Parallel optical nanolithography using nanoscale bowtie aperture array" (2010). Birck and NCN Publications. Paper 689.
http://dx.doi.org/10.1364/OE.18.007369