Parallel optical nanolithography using nanoscale bowtie aperture array
Date of this Version
3-2010Citation
Sreemanth M.V. Uppuluri, Edward C. Kinzel, Yan Li, and Xianfan Xu. Parallel optical nanolithography using nanoscale bowtie aperture array. Optics Express Vol. 18, Issue 7, pp. 7369-7375 (2010) https://doi.org/10.1364/OE.18.007369
This document has been peer-reviewed.
Abstract
We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated.
Discipline(s)
Engineering | Nanoscience and Nanotechnology
Comments
Sreemanth M.V. Uppuluri, Edward C. Kinzel, Yan Li, and Xianfan Xu. Parallel optical nanolithography using nanoscale bowtie aperture array. Optics Express Vol. 18, Issue 7, pp. 7369-7375 (2010) https://doi.org/10.1364/OE.18.007369