Very high-cycle fatigue failure in micron-scale polycrystalline silicon films: Effects of envrionment and surface oxide thickness

Author

• D. H. Alsem, Department of Materials Science and Engineering, University of California, Berkeley
• R. Timmerman, Department of Applied Physics, University of Groningen
• B. L. Boyce, Materials Science and Engineering Center, Sandia National Laboratories
• E A. Stach, Birck Nanotechnology Center and School of Materials Engineering, Purdue UniversityFollow
• J. Th. M. De Hosson, Department of Applied Physics, University of Groningen
• R. O. Ritchie, Department of Materials Science and Engineering, University of California, Berkeley

Abstract

Fatigue failure in micron-scale polycrystalline silicon structural films, a phenomenon that is not observed in bulk silicon, can severely impact the durability and reliability of microelectromechanical system devices. Despite several studies on the very high-cycle fatigue behavior of these films

Date of this Version

1-1-2007

Recommended Citation

Alsem, D. H.; Timmerman, R.; Boyce, B. L.; Stach, E A.; De Hosson, J. Th. M.; and Ritchie, R. O., "Very high-cycle fatigue failure in micron-scale polycrystalline silicon films: Effects of envrionment and surface oxide thickness" (2007). Birck and NCN Publications. Paper 42.
https://docs.lib.purdue.edu/nanopub/42