The origin of interferometric effect involving surface plasmon polariton in scattering near-field scanning optical microscopy

Yan Li, Purdue University, Birck Nanotechnology Center
Nan Zhou, Purdue University, Birck Nanotechnology Center
Edward C. Kinzel, Missouri University of Science and Technology
Xifeng Ren, University of Science and Technology of China
Xianfan Xu, Purdue University, Birck Nanotechnology Center

Abstract

Scattering near-field scanning optical microscopy (s-NSOM) has been developed to characterize optical near field with spatial resolution on the order of 10 nm. In this work we report investigation of the interferometric patterns commonly occurred in s-NSOM measurements. To reveal the origin of such interference patterns, a simple nanoslit is used. Comparing the measured result with a simplified analytical model as well as full-field numerical simulations, it is shown that the interference pattern is predominantly formed by the in-plane component of incidence light and surface plasmon polariton (SPP) launched by the nanoslit. This result helps to understand the responses of plasmonic nanostructures during s-NSOM measurements. (C)2014 Optical Society of America

Discipline(s)

Nanoscience and Nanotechnology