he electrical performance of Si‐doped n+‐n GaAs homojunction barriers grown by molecular‐beam epitaxy (MBE) is characterized and analyzed. We employed a successive etch technique to study hole injection currents in GaAs n+‐n‐p+ solar cells. The results of the analysis show that minority‐carrier holes in our MBE‐grown material have a mobility of 293 cm2/V s for an n‐type Si‐doping level of 1.5×1016 cm−3 at 300 K. The interface recombination velocity for these homojunction barriers is estimated to be less than 1×103 cm/s, and it appears to be comparable to that recently observed for Si‐doped n+‐n GaAs homojunction barriers grown by metalorganic chemical vapor deposition. We present evidence that these n+‐n GaAs homojunctions, unlike p+‐p GaAs homojunctions, are almost as effective as AlGaAs heterojunctions in minority‐carrier confinement, and that their electrical performance is not degraded by heavy doping effects.
Date of this Version
J. Appl. Phys. 66, (1989); doi: 10.1063/1.343868