Simulation, Construction, and Testing of a Lloyd’s Mirror Lithographic Interferometer
Abstract
Fabrication of nanoscale highly periodic structures is a vital capability for research on quasicrystals, directional and specular selective emitters, and plasmonics. Laser interference lithography is a maskless lithography process capable of producing patterns with high periodicity over large areas, and is compatible with standard optical lithography processing. In this work, a Lloyd’s mirror lithographic interferometer is simulated, built, and tested. Featuring a HeCd CW laser at 325 nm, spatial filter, and vacuum stage, it is capable of generating patterns with a sub-100 nanometer half pitch, over a large area (approximately 8 cm2 ), with minimal distortion, in a single exposure; with 2D patterns possible using multiple exposures. The interferometer features a compact sliding enclosure, simple alignment and operation, and quick adjustments to the desired period. One-dimensional and two-dimensional patterns were generated and matched well with simulation.
Degree
M.Sc.
Advisors
Bermel, Purdue University.
Subject Area
Electromagnetics|Optics|Physics
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