Optical direct-write nanolithography based on self-assembled resist
Holographic display is being developed for next generation mobile phones. However, manufacturing of miniature gratings for the holographic projectors cost a few thousand dollars today, not making the concept practical for commercial purposes. In this thesis, we discuss the feasibility of self-assembled nanoparticles to manufacture holographic gratings cost-effectively and at the nanoscale. Using our approach, the gratings can be manufactured at the scale of 20nm and the cost per chip is expected to cost a few dollars. In this thesis, a hydrophobic SAM was used to modify the surface of silicon. Direct-write UV laser lithography was used for photothermal patterning and obtain a hydrophobic-hydrophilic pattern. Experimental and numerical analysis of the patterning technique was done to investigate a possibility photothermal patterning mechanism. Lastly, the patterned substrate was functionalized with gold nanoparticle SAM to show the feasibility of producing the holographic gratings.
Pan, Purdue University.
Industrial engineering|Mechanical engineering|Nanotechnology
Off-Campus Purdue Users:
To access this dissertation, please log in to our