Optical direct-write nanolithography based on self-assembled resist
Abstract
Holographic display is being developed for next generation mobile phones. However, manufacturing of miniature gratings for the holographic projectors cost a few thousand dollars today, not making the concept practical for commercial purposes. In this thesis, we discuss the feasibility of self-assembled nanoparticles to manufacture holographic gratings cost-effectively and at the nanoscale. Using our approach, the gratings can be manufactured at the scale of 20nm and the cost per chip is expected to cost a few dollars. In this thesis, a hydrophobic SAM was used to modify the surface of silicon. Direct-write UV laser lithography was used for photothermal patterning and obtain a hydrophobic-hydrophilic pattern. Experimental and numerical analysis of the patterning technique was done to investigate a possibility photothermal patterning mechanism. Lastly, the patterned substrate was functionalized with gold nanoparticle SAM to show the feasibility of producing the holographic gratings.
Degree
M.S.M.E.
Advisors
Pan, Purdue University.
Subject Area
Industrial engineering|Mechanical engineering|Nanotechnology
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