Thermal Analog to AFM Force-Displacement Measurements for Nanoscale Interfacial Contact Resistance
Abstract
Thermal diffusion measurements on polymethylmethacrylate-coated Si substrates using heated atomic force microscopy tips were performed to determine the contact resistance between an organic thin film and Si. The measurement methodology presented demonstrates how the thermal contrast signal obtained during a force-displacement ramp is used to quantify the resistance to heat transfer through an internal interface. The results also delineate the interrogation thickness beyond which thermal diffusion in the organic thin film is not affected appreciably by the underlying substrate.
Date of this Version
5-2010
DOI
10.1063/1.3361157
Published in:
B. D. Iverson, J. E. Blendell, and S. V. Garimella, “Thermal Analog to AFM Force-Displacement Measurements for Nanoscale Interfacial Contact Resistance,” Review of Scientific Instruments Vol. 81, 036111, 2010.