Abstract
Three-dimensional direct simulation Monte Carlo (DSMC) method is applied here to model the electron-beam physical vapor deposition of copperthin films. Various molecular models for copper-copper interactions have been considered and a suitable molecular model has been determined based on comparisons of dimensional mass fluxes obtained from simulations and previous experiments. The variable hard sphere model that is determined for atomic copper vapor can be used in DSMC simulations for design and analysis of vacuum deposition systems, allowing for accurate prediction of growth rates, uniformity, and microstructure.
Date of this Version
2010
DOI
10.1116/1.3386592
Recommended Citation
Venkattraman, A and Alexeenko, Alina A., "Direct simulation Monte Carlo modeling of e-beam metal deposition" (2010). School of Aeronautics and Astronautics Faculty Publications. Paper 39.
http://dx.doi.org/10.1116/1.3386592
Comments
This is the published version of Venkattraman, A. and Alexeenko, A. “DSMC Modeling of E-Beam Metal Deposition”. First published in Journal Vacuum Science and Technology A and is available open access online at: http://dx.doi.org/10.1116/1.3386592.