Parallel optical nanolithography using nanoscale bowtie aperture array

Sreemanth MV Uppuluri, Purdue University - Main Campus
Edward C. Kinzel, Purdue University - Main Campus
Yan Li, Purdue University - Main Campus
Xianfan Xu, Birck Nanotechnology Center, School of Materials Engineering, Purdue University

Abstract

We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated.

Discipline(s)

Engineering | Nanoscience and Nanotechnology