Metal-oxide-semiconductor field-effect transistors on GaAs (111)A surface with atomic-layer-deposited Al2O3 as gate dielectrics

Xu M, Purdue University - Main Campus
Y Q. Wu, Purdue University - Main Campus
O Koybasi, Purdue University - Main Campus
T Shen, Purdue University - Main Campus
P. D. Ye, Birck Nanotechnology Center and School of Electrical and Computer Engineering, Purdue University

Abstract

GaAs inversion-mode metal-oxide-semiconductor field-effect transistors (MOSFETs) with atomic-layer-deposited Al2O3 as gate dielectrics are fabricated on (111)A and (100) surfaces. With the same channel length of 0.75 mu m, the maximum drain current of 15 mA/mm on n-channel MOSFET is obtained on (111)A surface, in great contrast to only 1 mu A/mm on (100) surface. For p-channel MOSFETs, maximum drain currents of 0.17 mA/mm and 0.8 mA/mm are obtained on (111)A and (100) surfaces, respectively. An empirical model is proposed to correlate the experimental observation with the existing III-V MOS theories.

Discipline(s)

Nanoscience and Nanotechnology