Rapid synthesis of few-layer graphene over Cu foil

A. Kumar, Birck Nanotechnology Center, Purdue University
A. A. Voevoclin, Birck Nanotechnology Center, Purdue University; United States Air Force, United States Department of Defense
Dmitri N. Zakharov, Birck Nanotechnology Center, Purdue University
Dmitry Zemlyanov, Birck Nanotechnology Center, Purdue University
Timothy S. Fisher, Birck Nanotechnology Center, Purdue University; United States Air Force, United States Department of Defense

Abstract

We report a unique process for rapid synthesis of few-layer graphene films on Cu foil by microwave plasma chemical vapor deposition (MPCVD). We show that the plasma/metal interaction can be advantageous for a rapid synthesis of such thin films. The process can produce films of controllable quality from amorphous to highly crystalline by adjusting plasma conditions during growth processes of similar to 100 s duration and with no supplemental substrate heating. Films have been characterized using Raman spectroscopy, scanning electron microscopy, transmission electron microscopy and X-ray photoelectron spectroscopy. The results help to identify the stages involved in the MPCVD deposition of thin carbon films on Cu foil, and the findings open new pathways for a rapid growth of few-layer graphene films. (C) 2011 Elsevier Ltd. All rights reserved.

Discipline(s)

Nanoscience and Nanotechnology