Parallel optical nanolithography using nanoscale bowtie aperture array
Date of this Version3-2010
Sreemanth M.V. Uppuluri, Edward C. Kinzel, Yan Li, and Xianfan Xu. Parallel optical nanolithography using nanoscale bowtie aperture array. Optics Express Vol. 18, Issue 7, pp. 7369-7375 (2010) https://doi.org/10.1364/OE.18.007369
This document has been peer-reviewed.
We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated.
Engineering | Nanoscience and Nanotechnology