Parallel optical nanolithography using nanoscale bowtie aperture array

Sreemanth MV Uppuluri, Purdue University - Main Campus
Edward C. Kinzel, Purdue University - Main Campus
Yan Li, Purdue University - Main Campus
Xianfan Xu, Birck Nanotechnology Center, School of Materials Engineering, Purdue University

Date of this Version



ISSN: 1094-4087

This document has been peer-reviewed.



We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated.


Engineering | Nanoscience and Nanotechnology