Squeeze-Film Hydrogel Deposition and Dry Micropatterning

Zhenwen Ding, Purdue University - Main Campus
Amani Salim, Purdue University - Main Campus
Babak Ziaie, Birck Nanotechnology Center, Purdue University

Date of this Version


This document has been peer-reviewed.



In this technical note, we demonstrate a squeeze-film based spacer-free method for creating controllable sub-micrometer hydrogel films on planar substrates that can be used to photolithographically fabricate hydrogel microstructures. This new technique improves the photolithographic resolution and yield by providing a uniform and low-defect hydrogel film. The optimum polymerization initiation time for achieving such a layer was determined to be around 1 min. For patterning, the dried hydrogel film was coated with a parylene-C masking layer. Subsequent etching in oxygen plasma was used to transfer selected patterns of hydrogel to the substrate in a batch scale.


Engineering | Nanoscience and Nanotechnology