Note: Thermal analog to atomic force microscopy force-displacement measurements for nanoscale interfacial contact resistance

Brian D. Iverson, Purdue University - Main Campus
John Blendell, Purdue University - Main Campus
Suresh Garimella, School of Mechanical Engineering

Date of this Version



DOI: 10.1063/1.3361157

This document has been peer-reviewed.



Thermal diffusion measurements on polymethylmethacrylate-coated Si substrates using heated atomic force microscopy tips were performed to determine the contact resistance between an organic thin film and Si. The measurement methodology presented demonstrates how the thermal contrast signal obtained during a force-displacement ramp is used to quantify the resistance to heat transfer through an internal interface. The results also delineate the interrogation thickness beyond which thermal diffusion in the organic thin film is not affected appreciably by the underlying substrate.


Engineering | Nanoscience and Nanotechnology