Observation of Coulomb repulsion between Cu intercalants in CuxBi2Se3
Date of this Version4-17-2014
Using scanning tunneling microscopy and ab initio simulations, we have identified several configurations for Cu dopants in CuxBi2Se3, with Cu intercalants being the most abundant. Through statistical analysis, we show strong short-range repulsive interactions between Cu intercalants. At intermediate range (>5 nm), the pair distribution function shows oscillatory structure along the < 10 (1) over bar > directions, which appear to be influenced by different diffusion barriers along the < 10 (1) over bar > and < 2 (1) over bar(1) over bar > directions.
Nanoscience and Nanotechnology