Near sputter-threshold GaSb nanopatterning
Date of this Version9-14-2013
Nanopatterning at sputter-threshold energies with Ar irradiation of GaSb (100) surfaces is presented. Comparison with high-energy irradiations up to 1000 eV is conducted measuring in-situ the composition evolution over irradiation time at early stages (e. g., < 10(17) cm(-2)) and up to nanostructure saturation (e. g., similar to 10(18) cm(-2)). Low-energy irradiation is conducted for energies between 15-100 eV and a low-aspect ratio nanostructured dot formation is found. Furthermore, the role of oxide on GaSb is found to delay nanostructure formation and this is predominant at energies below 100 eV. In-situ quartz crystal microbalance measurements collect sputtered particles yielding the sputter rate at threshold energies indicating a correlation between erosion and surface composition consistent with recent theoretical models. Ion-induced segregation is also found and indicated by both compositional measurements of both the surface and the sputtered plume. (C) 2013 AIP Publishing LLC.
Nanoscience and Nanotechnology