Graphene segregated on Ni surfaces and transferred to insulators
Date of this Version
September 2008Citation
APPLIED PHYSICS LETTERS 93, 113103, 2008
This document has been peer-reviewed.
Abstract
We report an approach to synthesize high quality graphene by surface segregation and substrate transfer. Graphene was segregated from Ni surface under the ambient pressure by dissolving carbon in Ni at high temperatures followed by cooling down with various rates. Different cooling rates led to different segregation behaviors, strongly affecting the thickness and quality of the graphene films. Electron microscopy and Raman spectroscopy indicated that the graphene films synthesized with medium cooling rates have high quality crystalline structure and well-controlled thicknesses. The graphene films were transferred to insulating substrates by wet etching and found to maintain their high quality. (C) 2008 American Institute of Physics.
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