We have studied the capacitance-voltage (C- V) characteristics of Schottky barriers on inverted nGaAs/ N-AIGaAs and normal N-AIGaAs/n-GaAs heterojunctions. Impurities introduced during film growth produced a negative sheet charge of 6.0 X 10 II cm -2 at the interface of the inverted n-GaAs/N-AIGaAs heterojunction. The effectiveness of GaAs quantum wells in trapping these impurities was investigated. GaAs quantum wells 20 A wide were placed in intervals of 2500 A for the first 0.75 pm of the AIGaAs layer; in the last 0.25 pm, the periodicity of the quantum wells was progressively decreased by half with the last quantum well placed at about 160 A from the GaAs/ AIGaAs interface. The resulting measured interface charge concentration of 4.4 X 1010 cm -2 is more than a magnitude lower than measured before the use of the quantum wells and is essentially at the limit of the accuracy of the C-V technique for this structure.
Date of this Version
Appl. Phys. Lett. 48, 428 (1986)