Correlating electrical resistance to growth conditions for multiwalled carbon nanotubes
Date of this VersionAugust 2007
APPLIED PHYSICS LETTERS 91, 093105 2007
This document has been peer-reviewed.
A correlation between growth temperature and electrical resistance of multiwalled carbon nanotubes MWNTs has been established by measuring the resistance of individual MWNTs grown by microwave plasma-enhanced chemical vapor deposition PECVD at 800, 900, and 950 °C. The lowest resistances were obtained mainly from MWNTs grown at 900 °C. The MWNT resistance is larger on average at lower 800 °C and higher 950 °C growth temperatures. The resistance of MWNTs correlated well with other MWNT quality indices obtained from Raman spectra. This study identifies a temperature window for growing higher-quality MWNTs with fewer defects and lower resistance by PECVD.