Lithography on GaP(100) surfaces

Rosangelly Flores-Perez, Purdue University - Main Campus
Dmitry Zemlyanov, Birck Nanotechnology Center, Purdue University
Albena Ivanisevic, Birck Nanotechnology Center, Purdue University

Date of this Version

6-1-2008

Citation

Surface Science 602 (2008) 1993–1998

This document has been peer-reviewed.

 

Abstract

Two types of lithographic methods were used to modify GaP(1 00) surfaces with commercially available alkanethiol molecules: microcontact printing (mu CP) and "dip-pen" nanolithography (DPN), The patterned surfaces were characterized by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS). The characterization was done in order to understand the quality of each type of pattern, its chemical composition, and the organization of the molecules on the surface. Differences between the two lithographic methods used to do lithography on the GaP(1 00) in this study were dependent on the chosen molecular "ink".

Discipline(s)

Nanoscience and Nanotechnology

 

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