Nanolithography using high transmission nanoscale ridge aperture probe

Nicholas Murphy-DuBay, Purdue University - Main Campus
Liang Wang, Purdue University - Main Campus
Xianfan Xu, Birck Nanotechnology Center, School of Materials Engineering, Purdue University

Date of this Version

12-2008

Citation

Appl Phys A (2008) 93: 881–884

This document has been peer-reviewed.

 

Abstract

Nanoscale ridge apertures provide a highly confined radiation spot with a high transmission efficiency when used in the near field approach. The radiation confinement and enhancement is due to the electric-magnetic field concentrated in the gap between the ridges. This paper reports the experimental demonstration of radiation enhancement using such antenna apertures and lithography of nanometer size structures. The process utilizes a NSOM (near field scanning optical microscopy) probe with a ridge aperture at the tip, and it combines the nonlinear two photon effect from femtosecond laser irradiation to achieve sub-diffraction limit lithography resolution.

Discipline(s)

Nanoscience and Nanotechnology

 

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