MoS2 Dual-Gate MOSFET With Atomic-Layer-Deposited Al2O3 as Top-Gate Dielectric

Han Liu, Birck Nanotechnology Center, Purdue University
Peide Ye, Birck Nanotechnology Center, Purdue University

Abstract

We demonstrate atomic-layer-deposited (ALD) high-k dielectric integration on 2-D layer-structured molybdenum disulfide (MoS2) crystals and MoS2 dual-gate n-channel MOSFETs with ALD Al2O3 as the gate dielectric. Our C-V study of MOSFET structures shows good interface between 2-D MoS2 crystal and ALD Al2O3. Maximum drain currents using back gates and top gates are measured to be 7.07 and 6.42 mA/mm, respectively, at V-ds = 2 V with a channel width of 3 mu m, a channel length of 9 mu m, and a top-gate length of 3 mu m. We achieve the highest field-effect mobility of electrons using back-gate control to be 517 cm(2)/V.s. The highest current on/off ratio is over 10(8).

Discipline(s)

Nanoscience and Nanotechnology