A nanofluidic channel with embedded transverse nanoelectrodes

Authors

T. Maleki
S. Mohammadi
B. Ziaie

Abstract

In this paper, we demonstrate fabrication and characterization of a nanofluidic channel with embedded transverse nanoelectrodes using a combination of conventional photolithography and focused ion beam technologies. Glass-capped silicon dioxide nanochannels having 20 nm depth, 50 nm width, and 2 m length with embedded platinum nanoelectrodes were fabricated. Channel patency was verified through measurements of the resistivity in phosphate buffered saline and electrostatic action on charged fluorescent nanospheres. Platinum nanoelectrode functionality was also tested using transverse resistance measurements in nanochannels filled with air, deionized water, and saline solution.

Comments

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Keywords

electrical resistivity, electrodes, focused ion beam technology, nanofabrication, Nanofluidics, Photolithography, Platinum, Silicon compounds

Date of this Version

January 2009

DOI

http://dx.doi.org/10.1088/0957-4484/20/10/105302

Published in:

Nanotechnology 20,10 (2009) 105302 (6 pp.)-105302 (6 pp.);