Surface Modification of Nanofiltration Membranes by Ion Implantation
This study involves modifying the surface of nanofiltration (NF) membranes by ion implantation for increased salt rejection. F? ions were implanted on the surface of commercially available nanofiltration membranes to increase the negativity of the membrane surfaces. The objective was to increase the Donnan exclusion effect and thus increasing the salt rejection by the modified membranes. A composite polyamide NF membrane (NF 90 Filmtec) and a cellulose acetate NF membrane (SP 28 Osmonics) were implanted with F? ions at two different intensities--1E10 and 5E10 atoms/cm2. Zeta potential measurements of the unmodified membranes and modified membranes show higher negativity with an increased intensity of ion implantation. Multicomponent salt permeation experiments were performed with the three types of membranes--the unmodified membrane and the two types of modified ones for both NF 90 and SP 28. The results show a decrease of solute flux for all the ions through the modified membranes when compared to that with the unmodified membrane. Initial experiments show no leaching of F? ions into the solution. Therefore, ion implantation on nanofiltration membrane surfaces is a novel technique to increase the salt rejection property of membranes.
Ion implantation; Nanofiltration; Fluoride ion; Salt rejection
Date of this Version
Journal of Membrane Science, 254(1-2), 303-310. DOI: 10.1016/j.memsci.2005.01.004
Amsterdam, Elsevier Scientific Pub. Co.
ALS NSCORT Project Number
Project 5 - Membranes
Kimberly L. Jones
ALS NSCORT Series
Dave Kotterman, email@example.com
Copyright 2005 Elsevier B.V. All rights reserved. For more information please visit the author's rights section of the publisher's website at: http://www.elsevier.com/wps/find/authorsview.authors/authorsrights or the publisher's home page at: http://www.elsevier.com
This article is not available through e-pubs. Current Purdue University Faculty, Staff and Students may also access the full-text, electronic version of the article at: http://dx.doi.org/10.1016/j.memsci.2005.01.004
This document is currently not available here.